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Modeling of plasma surface interactions from atomic scale to microscopic scale

par Caroline CHAMPENOIS - publié le

séminaire

jeudi 3 décembre 2015 à 14:00, service 322 du campus Saint-Jérôme

Ning Ning
laboratoire des Sciences des Procédés et des Matériaux, Paris XIII

Abstract
The study of chemical and physical processes involved in plasma surface interactions is important for the evolution of nuclear fusion reactors, microelectronics and space technology. I have studied reaction mechanisms involved in plasma-surface interactions on an atomic scale by using molecular dynamic simulations. I’ve conducted a comparative study on the dynamics of hydrogenated silicon cluster deposition on a crystalline silicon substrate for various cluster sizes, impact energies, incidence angles and substrate temperatures. Under certain conditions, I observed decomposing of Si clusters after the impact on the substrate, followed by a recrystallization, which could be a possible explanation for epitaxial silicon growth at low temperatures. Afterwards, I have joined group of David Graves at UC Berkeley, where I studied the plasma deactivation of the bacteria endotoxin molecular Lipid A and the role of plasma–surface interactions in the control of plasma distribution functions during the erosion of a-C:H film by H2 plasma using MD simulations. We found the synergetic effect of ion bombardments and radicals in the surface modification, and identified the mechanisms involved in the plasma-surface interactions. Both subjects were parts of research projects funded by the Department of Energy. I have continued to study hydrogen plasma – surface interactions with Xavier Bonnin from ITER, because of its direct implications for the plasma facing material study in fusion device. In order to gain insight into the process on a larger scale, I was using a rate equation model to study the hydrogen isotope retention and outgassing process inside the plasma facing material during a real tokamak material thermal cycle. In the last part of my presentation, I will show that with experiences in the modeling of plasma-surface interactions on both atomic and microscopic scale, I can combine those tools into the further research topics in order to understand and optimize the involving process.

Contact local : Sergey Khrapak

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