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CARTRY Gilles

+33 (0) 491288 959

Professeur - Université d’Aix Marseille

Thèmes de recherche

- Production d’ions négatifs à l’interaction plasma-surface : application aux injecteurs de neutres de la fusion

- Interaction des plasmas d’hydrogène avec les matériaux d’intérêt pour la fusion : rétention, érosion, réflexion

- Interaction plasma-surfaces dans les procédés plasmas de la microélectronique : gravure par plasmas fluorocarbonés

Recherches actuelles

- Production d’ions négatifs à l’interaction plasma-surface : application aux injecteurs de neutres de la fusion

- Interaction des plasmas d’hydrogène avec les matériaux d’intérêt pour la fusion : rétention, érosion, réflexion

Parcours de recherche

Depuis le 01/09/2015 : Professeur 28ème section, Université d’Aix Marseille

2008-2015
Maître de conférence 28ème section / Université de Provence
Habilitation à Diriger des Recherches (HdR Février 2010)

2006-2008 :
Délégation CNRS / Université de Provence
Laboratoire de Physique des Interactions Ioniques et Moléculaires (PIIM)

2000-2006 :
Maître de conférence 63ème section / Université de Nantes
Institut des Matériaux Jean Rouxel de Nantes (IMN)

1999-2000 :
ATER temps plein 30ème section/ Université de Paris Sud, Orsay
Laboratoire de Physique des Gaz et des Plasmas

1996-1999 :
Doctorat / Université de Paris Sud
Laboratoire de Physique des Gaz et des Plasmas
Titre : Etude par spectroscopie de la cinétique des décharges électriques dans les mélanges N2-O2

Bibliographie

Articles

- A39- Pardanaud C, Martin C, Cartry G, Ahmad A, Schiesko L, Giacometti G, Carrere M and Roubin P 2015 In-plane and out-of-plane defects of graphite bombarded by H, D and He investigated by atomic force and Raman microscopies J. Raman Spectrosc. 46 256–65

- A38- Mellet N, Martin C, Pégourié B, Giacometti G, Gunn J P, Cartry G, Languille P, Pardanaud C, Panayotis S, Amiard G, Marandet Y and Roubin P (2014) Modelling of the micrometric erosion pattern observed on the Tore Supra limiter tiles Nuclear Fusion 54 123006

- A37- Ahmad Ahmad, Cédric Pardanaud, Marcel Carrère, Jean-Marc Layet, Alix Gicquel, Pravin Kumar, David Eon, Cédric Jaoul, Richard Engeln and Gilles Cartry, Negative-ion production on carbon materials in hydrogen plasma : influence of the carbon hybridization state and the hydrogen content on H− yield.,
J. Phys. D : Appl. Phys. 47 (2014) 085201 (14pp)

- A36- A Ahmad, J Dubois, T Pasquet, M Carrère, J M Layet, J B Faure, G Cartry, P Kumar, T Minéa, S Mochalskyy and A Simonin, Negative-ion surface production in hydrogen plasmas : modeling of negative-ion energy distribution functions and comparison with experiments
Plasma Sources Sci. Technol. 22 (2013) 025006 (15pp)

- A35- Ludovic Godet, Svetlana Radovanov, Jay Sheuer, Christophe Cardinaud, Nicolas Fernandez, Yves Ferro and Gilles Cartry, Ion energy distributions measured inside a high-voltage cathode in a BF3 pulsed dc plasma used for plasma doping : experiments and ab initio calculations
Plasma Sources Sci. Technol. 21 (2012) 065006

- A34- G. Cartry, L. Schiesko, C. Hopf, A. Ahmad, M Carrère, J. M. Layet, P. Kumar, and R. Engeln
Production of negative ions on graphite surface in H2/D2 plasmas : Experiments and SRIM calculations
Physics of Plasmas 19, 063503 (2012)

- A33- P Kumar, A Ahmad, C Pardanaud, M Carrère, J M Layet, G Cartry, F Silva, A Gicquel and R Engeln
Enhanced negative ion yields on diamond surfaces at elevated temperatures
Fast track communication, J. Phys. D : Appl. Phys. 44 (2011) 372002

- A32- E. Aréou, G. Cartry, J.-M. Layet, and T. Angot, Hydrogen-graphite interaction : Experimental evidences of an adsorption barrier, The journal of chemical physics 134, 014701 (2011)

- A31- L Schiesko, M Carrère, J M Layet and G Cartry , A comparative study of H- and D- production on graphite surfaces in H2 and D2 plasmas, Plasma Sources Sci. Technol. 19 (2010) 045016

- A30- L Schiesko, M Carrère, J M Layet and G Cartry , Negative ion surface production through sputtering in hydrogen plasma, Applied Physics Letters 95, (2009) 191502

- A29- L Schiesko, M Carrère, G Cartry and J M Layet, Experimental study and modeling of the electron attracting-sheath : the influence of secondary electron emission, Physics of Plasmas 15 (2008) 073507

- A28- L Schiesko, M Carrère, G Cartry and J M Layet, H− production on a graphite surface in a hydrogen plasma, Plasma Sources Sci. Technol. 17 (2008) 035023

- A27- Bousquet A, Granier A, Cartry G, Goullet A, Kinetics of O and H atoms in pulsed O(2)/HMDSO low pressure PECVD plasmas , Journal of opt. Adv. Mat. 10 (2008) 1999

- A26- V Raballand, G Cartry, C Cardinaud, A model for Si, SiCH, SiO2, SiOCH, and porous SiOCH etch rates calculation in inductively coupled fluorocarbon plasma with a pulsed bias : importance of the fluorocarbon layer, J. Appl. Phys., 102 (6) : 063306 (2007)

- A25- V Raballand, G Cartry, C Cardinaud, Porous SiOCH, SiCH, and SiO2 Etching in High Density Fluorocarbon Plasma with a Pulsed BiasPlasma Process. Polym.4 563–573 (2007)

- A24- A Bousquet, G Cartry and A Granier, Investigation of O-atom kinetics in O2, CO2, H2O and O2/HMDSO low pressure pulsed plasmas by Time-Resolved Optical Emission Spectroscopy
Plasma Sources Sci. Technol. 16 (2007) 597-605

- A23- D. Eon, V. Raballand, G. Cartry and C. Cardinaud, High density fluorocarbon plasma etching of methylsilsesquioxane SiOC(H) low-k material and SiC(H) etch stop layer : surface analyses and investigation of etch mechanisms, J. Phys. D : Appl. Phys. 40 (2007) 3951-3959

- A22- L. Schiesko, M Carrère, G. Cartry and J.M. Layet, Positive sheath behaviour in low pressure Argon plasma, J. Nuclear Mat. 363-365 (2007) 1016-1020

- A21- L. V. Gatilova, K. Allegraud, J. Guillon, Y. Z. Ionikh, G. Cartry, J. Roepcke and A. Rousseau
NO formation mechanisms studied by infrared laser absorption in a single low pressure plasma pulse
Plasma Sources Sci. Technol. 16 (2007) S107–S114

- A20- Smid R, Granier A, Bousquet A, Cartry G, Zajickova L , Study of magnetic field influence on charged species in a low pressure helicon reactor, Czech. J. Phys. 56 : B1091-B1096 Part 6 Suppl. B 2006

- A19- D. Eon, V. Raballand, G. Cartry and Ch. Cardinaud, Plasma oxidation of new Polyhedral Oligomeric Silsesquioxanes based polymers, J. Vac. Sci. Technol. B 24 (2006) 2678

- A18- L. Godet, Z. Fang, S. Radovanov, S. Walther, E. Arevalo, F. Lallement, J. T. Scheuer, T. Miller, D. Lenoble, G. Cartry, C. Cardinaud, Plasma doping implant depth profile calculation based on ion energy distribution measurements, J. Vac. Sci. Technol. B 24-5 (2006) 2391-97

- A17- G Cartry, X Duten, A Rousseau, Atomic oxygen surface loss probability on silica in microwave plasmas studied by a pulsed induced fluorescence technique, Plasma Sources Sci. Technol. 15 (2006) 479–488

- A16- F. Gaboriau, G. Cartry, M-C. Peignon and Ch. Cardinaud, Etching mechanisms of Si and SiO2 in fluorocarbon ICP plasmas : Analysis of the plasma by mass spectrometry, Langmuir probe and optical emission spectroscopy, J. Phys. D : Appl. Phys. 39 (2006) 1830–1845

- A15- E. Laffosse, J. Baylet, J.P. Chamonal, G. Destefanis, G. Cartry, C. Cardinaud, Inductively coupled plasma etching of HgCdTe using a CH4 based mixture , Journal of Electronic Materials, 34 740-746 (2005)

- A14- S.Radovanov, L.Godet, R. Dorai , Z.Fang, B. W. Koo, C. Cardinaud , G. Cartry,
D. Lenoble and A. Grouillet, Ion Energy Distributions in a Pulsed Plasma Doping System
J. Appl. Phys. 98 113307 (2005)

- A13- Gaboriau F., Peignon M.C., Cartry G. and Cardinaud Ch., Etching mechanisms of Si and SiO2 in fluorocarbon ICP plasmas : Correlation between plasma species and surface etching
J. Vac. Sci. Technol. A 23, 226 (2005)

- A12- D. Eon, V. Raballand, G. Cartry, M-C. Peignon- Fernandez, Ch. Cardinaud, Etching of low-k materials in high density fluorocarbon plasma, The European Physical Journal - Applied Physics, 28, 331 (2004)

- A11- B.W. Koo, Z. Fang, L. Godet, S. Radovanov, Ch. Cardinaud, G. Cartry, A.Grouillet, and D. Lenoble
Plasma Diagnostics in Pulsed Plasma Doping (P2LAD) System, IEEE Transactions on Plasma Science 32-2, 456-463 (2004)

- A10- D. Eon, G. Cartry, V. Fernandez, C. Cardinaud, E. Tegou, V. Bellas, P. Argitis, and E. Gogolides
Surface segregation of photoresist copolymers containing Polyhedral Oligomeric Silsesquioxanes (POSS) studied by X-ray photoelectron spectroscopy., J. Vac. Sci. Technol. B, 22, 2526 (2004)

- A9- Evangelia Tegou, Vassilios Bellas, Evangelos Gogolides, Panagiotis Argitis, David Eon, Gilles Cartry, and Christophe Cardinaud, Polyhedral Oligomeric Silsesquioxane (POSS) Based Resists : Material Design Challenges and Lithographic Evaluation at 157 nm, Chem. Mater. 16, 2567-2577 (2004)

- A8- A. Tserepi, G. Cordoyiannis, G.P. Patsis, V. Constantoudis, E. Gogolides, E.S. Valamontes, D. Eon, M.C. Peignon, G. Cartry, Ch. Cardinaud, and G. Turban, Etching behavior of Si-containing polymers as resist materials for bilayer lithography : the case of poly-dimethyl siloxane, J. Vac. Sci. Technol. B 21-1, 174-182 (2003)

- A7- Abada H., Chabert C ;, Booth J.P., Robiche J., Cartry G., Gas temperature gradients in a CF4 inductive discharge, J. Appl. Phys. 92-8, 4223-4230 (2002)

- A6- Gaboriau F., Cartry G., Peignon M.C., Cardinaud Ch., Selective and deep plasma etching of SiO2 : Comparison between different fluorocarbon gases (CF4, C2F6, CHF3) mixed with CH4 or H2 and influence of the residence time, J. Vac. Sci. Technol. B 20-4, 1514-1521 (2002)

- A5- Gaboriau F., Peignon M.C., Cartry G., Rolland L., Eon D., Cardinaud Ch., Turban G., Langmuir probe measurements in an inductively coupled plasma : electron energy distribution functions in polymerizing fluorocarbon gases used for selective etching of SiO2, J. Vac. Sci. Technol. A 20-3, 919-927 (2002)

- A4- Rousseau A., Cartry G. et Duten X., H-Atom surface recombination processes studied by a pulsed plasma excitation technique, J. Appl. Phys. 89 2074-2078 (2001)

- A3- Cartry G., Magne L. et Cernogora G., Atomic oxygen recombination on fused silica : modelling and comparison to low temperature experiments (300 K), J. Phys. D. : Appl. Phys. 33, 1303-1314 (2000)

- A2- Cartry G., Magne L. et Cernogora G., Atomic oxygen recombination on fused silica : experimental evidence of the surface state influence, J. Phys. D. : Appl. Phys. 32, L53-L56 (1999)

- A1- Cartry G., Magne L. et Cernogora G., Experimental study and modelling of a low-pressure N2-O2 time afterglow, J. Phys. D : Appl. Phys. 32, 1894-1907 (1999)

• Ouvrages individuels et collectifs :

- L1- N. Vourdas, V.Bellas, E. Tegou, O. Brani, V. Constantoudis, P. Argitis, A. Tserepi, E. Gogolides D. Eon, G. Cartry, Ch. Cardinaud, Oxygen plasma modification of Polyhedral oligomeric silsesquioxane (POSS copolymers) : application to micro and nano fabrication, Chapitre de : “Plasma Processes and Polymers”, R. d’Agostino, P. Favia, C. Oehr, M. Wertheimer Eds., Wiley VCH (2005)

- L2- A. Bousquet, A. Goullet, G. Cartry, A. Granier
“Thin film deposition from low-pressure oxygen / hexamethyldisiloxane mixture in radiofrequency pulsed plasma” , E. Tomasella (Eds), Cold plasma for thin film deposition : Processes, characterizations and applications, Research Signpost, India, , ISBN 978-81-308-0419-4.

• Autres :

L. Schiesko, G. Cartry, C. Hopf, T. Höschen, G. Meisl, O. Encke, P. Franzen, B. Heinemann, K. Achkasov, C. Hopf and U. Fantz
Cs-Doped Mo as Surface Converter for H- / D- Generation in Negative Ion Sources : First Steps and Proof of Principle, AIP CONFERENCE PROCEEDINGS, à paraître

G. Cartry
Negative-ion surface production in hydrogen plasmas : modelling of negative-ion energy distribution functions and comparison with experiments
Hiden Life 1120/05 Thin Films, Plasma and Surface Engineering (2013)
http://www.hidenanalytical.com/en/component/content/article/218-newsletters/hiden-life/530-hiden-life-1120-05-thin-films-plasma-and-surface-engineering?highlight=WyJoaWRlbiIsImxpZmUiLCJoaWRlbiBsaWZlIl0=

Schiesko L, Carrere M, Cartry G, et J.M. Layet
Caesium Free Negative Ion Sources for Neutral Beam Injectors : a Study of Negative Ion Production on Graphite Surface in Hydrogen and Deuterium Plasma, 1st International Symposium on Negative Ions, Beams and Sources, SEP 09-12, 2008 Aix en Provence, FRANCE, AIP CONFERENCE PROCEEDINGS Volume : 1097 Pages : 84-88 (2009)

• Conférences invitées :

Je n’indique ici que les conférences pour lesquelles j’ai été invitées.

- C7- G. Cartry, Negative-ion sources for fusion applications
“Fusion Frontiers and Interfaces” workshop, University of York, 12-14 Mai 2014

- C6- G. Cartry, Production d’ions négatifs en surface. Application à la fusion magnétique contrôlée
Congrès PLASMAS de la SFP, 22-24 mai 2012, Orléans, (Conférence invitée)

- C5- G. Cartry, L. Schiesko, M. Carrère, J.M. Layet, Negative Ion Surface Production in Low Pressure Plasma, AVS 56th International Symposium & Exhibition, San Jose, CA, USA, November 8 - 13, 2009

- C4- L. Schiesko, M. Carrère, G. Cartry, J.M. Layet, Negative ion sources for tokamak neutral beam injectors : a study of negative ion production on graphite surface in H2 / D2 plasma
29th ICPIG, Workshop Non-thermal plasma physics relevant to fusion, 12-17 juillet 2009, Cancun, Mexique

- C3- L. Schiesko, M. Carrère, G. Cartry, J.M. Layet, Caesium free negative ion sources for tokamak neutral beam injectors : a study of negative ion production on graphite surface in H2/D2 plasma
36th EPS Conference on Plasma Physics, June 29 - July 3, 2009, Sofia, Bulgaria

- C2- G Cartry, C Thomas, E Areou, L Schiesko, M Carrere, JM Layet, T Angot, P Roubin
Study of elementary processes of plasma-wall interaction in fusion devices by means of an inductively coupled hydrogen plasma in interaction with graphite surfaces, 61st Gaseous Electronics Conference, 14-17 October 2008, Dallas (USA)

- C1- Cartry G, Eon D, Raballand V, Gaboriau F, Peignon-fernandez MC and Cardinaud Ch.
Etching of Low-k Materials in Inductively Coupled Fluorocarbon Plasmas
CIP (Colloque International sur les Plasmas), Autrans, France, 05 juin – 09 Juin 2004